ELECTRON-BEAM EXPOSURE OF NEGATIVE RESISTS

被引：0
|
作者：
ERSOY, O [1 ]
机构：
[1] CENT INST IND RES,OSLO,NORWAY
来源：
OPTIK | 1976年 / 45卷 / 04期
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：345 / 353
页数：9
相关论文
共 50 条
  • [21] Amorphous molecular materials: development of novel negative electron-beam molecular resists
    Kadota, T
    Kageyama, H
    Wakaya, F
    Gamo, K
    Shirota, Y
    MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2001, 16 (1-2): : 91 - 94
  • [22] HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY WITH NEGATIVE ORGANIC AND INORGANIC RESISTS
    BERNSTEIN, GH
    LIU, WP
    KHAWAJA, YN
    KOZICKI, MN
    FERRY, DK
    BLUM, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2298 - 2302
  • [23] APPLICATION OF POLYMER BISAZIDE COMPOSITE SYSTEM NEGATIVE RESISTS TO ELECTRON-BEAM LITHOGRAPHY
    TANIGAKI, K
    SUZUKI, M
    OHNISHI, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06): : 1594 - 1599
  • [24] EXPOSURE CHARACTERISTICS OF ELECTRON-BEAM RESISTS FOR SYNCHROTRON X-RAY-LITHOGRAPHY
    KIMURA, T
    MOCHIJI, K
    TSUMITA, N
    OBAYASHI, H
    MIKUNI, A
    KANZAKI, H
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 2 - 7
  • [25] PLASMA-DEVELOPABLE ELECTRON-BEAM RESISTS
    YONEDA, Y
    MIYAGAWA, M
    FUKUYAMA, S
    NARUSAWA, T
    OKUYAMA, H
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 539 : 145 - 150
  • [26] LANGMUIR-BLODGETT ELECTRON-BEAM RESISTS
    PETERSON, IR
    IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION, 1983, 130 (05): : 252 - 255
  • [27] ORGANIC RESISTS FOR ELECTRON-BEAM LITHOGRAPHY - A REVIEW
    MITRA, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C374 - C374
  • [28] PLASMA-DEVELOPABLE ELECTRON-BEAM RESISTS
    YONEDA, Y
    FUKUYAMA, S
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1987, 23 (01): : 37 - 43
  • [29] Monolayers of fluorinated silanes as electron-beam resists
    StJohn, PM
    Craighead, HG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 69 - 74
  • [30] POLY(OLEFIN SULFONE) ELECTRON-BEAM RESISTS
    PAMPALONE, TR
    JOURNAL OF IMAGING SCIENCE, 1986, 30 (04): : 160 - 166
12345