ELECTRON-BEAM EXPOSURE OF NEGATIVE RESISTS

被引：0
|
作者：
ERSOY, O [1 ]
机构：
[1] CENT INST IND RES,OSLO,NORWAY
来源：
OPTIK | 1976年 / 45卷 / 04期
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：345 / 353
页数：9
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