GROWTH-RATES OF ALUMINUM ETCH TUNNELS

被引：62

作者：

HEBERT, K ^{[1
]}

ALKIRE, R ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CHEM ENGN,URBANA,IL 61801

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 10期

关键词：

D O I：

10.1149/1.2095356

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2447 / 2452

页数：6

共 16 条

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[6]

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[7] ANODIC DISSOLUTION AND PITTING OF NICKEL MONOCRYSTAL ELECTRODES [J].

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[8] GROWTH AND PASSIVATION OF ALUMINUM ETCH TUNNELS [J].

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ALKIRE, R .

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[9]

HEBERT KR, 1985, THESIS U ILLINOIS UR

[10]

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