EFFECT OF NONPARABOLIC ENERGY BANDS ON TUNNELING THROUGH THIN INSULATING FILMS

被引：44

作者：

STRATTON, R

LEWICKI, G

MEAD, CA

机构：

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1966年 / 27卷 / 10期

关键词：

D O I：

10.1016/0022-3697(66)90238-1

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1599 / &

共 19 条

[1] SCHOTTKY EMISSION THROUGH THIN INSULATING FILMS [J].

EMTAGE, PR ;

TANTRAPORN, W .

PHYSICAL REVIEW LETTERS, 1962, 8 (07) :267-&

[2] TUNNELING THROUGH THIN INSULATING LAYERS [J].

FISHER, JC ;

GIAEVER, I .

JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) :172-&

[3] On the electrical resistance of contacts between solid conductors [J].

Frenkel, J .

PHYSICAL REVIEW, 1930, 36 (11) :1604-1618

[4]

GEIGER H, 1933, HANDBUCH PHYSIK ED, V24, P450

[5] THEORETICAL SHAPE OF METAL-INSULATOR-METAL POTENTIAL BARRIERS [J].

GEPPERT, DV .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (03) :490-&

[6] TUNNELING FROM AN INDEPENDENT-PARTICLE POINT OF VIEW [J].

HARRISON, WA .

PHYSICAL REVIEW, 1961, 123 (01) :85-&

[7] ELECTRON TUNNELING THROUGH THIN ALUMINUM OXIDE FILMS [J].

HARTMAN, TE ;

CHIVIAN, JS .

PHYSICAL REVIEW, 1964, 134 (4A) :1094-+

[8] TUNNELING THROUGH ASYMMETRIC BARRIERS [J].

HARTMAN, TE .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (11) :3283-&

[9]

HOLM R, 1951, J APPL PHYS, V22, P509

[10]

LEWICKI G, TO BE PUBLISHED

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