Near-field direct-write ultraviolet lithography and shear force microscopic studies of the lithographic process

被引：95
作者：
Smolyaninov, II
Mazzoni, DL
Davis, CC
机构：
[1] Electrical Engineering Department, University of Maryland, College Park
来源：
APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 26期
关键词：
D O I：
10.1063/1.115297
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Direct-write lithography on a 100 nm scale has been carried out using the near-field optical interaction between an uncoated tapered fiber tip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphological changes in the photoresist before development. (C) 1995 American Institute of Physics.
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页码：3859 / 3861
页数：3
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