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被引:9
作者
HAWRYLUK, RJ
机构
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D O I
10.1063/1.331408
中图分类号
O59 [应用物理学];
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页码:5985 / 5985
页数:1
相关论文
共 6 条
[1]  
HAWRYLUK AM, 1974, 197451 LINC LAB TECH
[2]   ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING - EXPERIMENT [J].
HAWRYLUK, RJ ;
SMITH, HI ;
SOARES, A ;
HAWRYLUK, AM .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) :2528-2537
[3]   EXPOSURE AND DEVELOPMENT MODELS USED IN ELECTRON-BEAM LITHOGRAPHY [J].
HAWRYLUK, RJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (01) :1-17
[4]   ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J].
HAWRYLUK, RJ ;
HAWRYLUK, AM ;
SMITH, HI .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2551-2566
[5]  
HAWRYLUK RJ, 1974, 6TH P INT C EL ION B, P87
[6]   NEW MODEL OF ELECTRON FREE-PATH IN MULTIPLE LAYERS FOR MONTE-CARLO SIMULATION [J].
HORIGUCHI, S ;
SUZUKI, M ;
KOBAYASHI, T ;
YOSHINO, H ;
SAKAKIBARA, Y .
APPLIED PHYSICS LETTERS, 1981, 39 (06) :512-514