STUDIES ON ORGANOSILICON REACTIVE INTERMEDIATES .6. PHOTOLYSIS OF TRISILANES CONTAINING HETEROCYCLES

被引：2
作者：
WU, SH
QIAN, H
WU, G
JIANG, N
机构：
[1] Department of Chemistry, Fudan University, Shanghai
[2] Department of Chemistry, Ucla, Los Angeles, California
[3] Department of Chemistry, Washington University, St Louis, Missouri
来源：
HETEROATOM CHEMISTRY | 1992年 / 3卷 / 5-6期
关键词：
D O I：
10.1002/hc.520030522
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Both 2-phenyl-2-furylhexamethyltrisilane (1) and 2-phenyl-2-thienylhexamethyltrisilane (2) were synthesized by conventional organometallic reactions. The photolysis of 1 in the presence of 2,3-dimethyl-1,3-butadiene led to normal silylene-olefin addition and silylene C-H insertion reactions. However, when 2 was photolyzed in a methanol-cyclohexene system, an apparent radical reaction occurred. We suspect that the sulfur atom of the thienyl group strongly stabilizes a silyl radical. This result was supported by both identifying its typical radical reaction products and examining the ESR spectrum of its adduct with a radical trap.
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页码：589 / 597
页数：9
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