STUDIES ON ORGANOSILICON REACTIVE INTERMEDIATES .6. PHOTOLYSIS OF TRISILANES CONTAINING HETEROCYCLES

被引：2

作者：

WU, SH

QIAN, H

WU, G

JIANG, N

机构：

[1] Department of Chemistry, Fudan University, Shanghai

[2] Department of Chemistry, Ucla, Los Angeles, California

[3] Department of Chemistry, Washington University, St Louis, Missouri

来源：

HETEROATOM CHEMISTRY | 1992年 / 3卷 / 5-6期

关键词：

D O I：

10.1002/hc.520030522

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Both 2-phenyl-2-furylhexamethyltrisilane (1) and 2-phenyl-2-thienylhexamethyltrisilane (2) were synthesized by conventional organometallic reactions. The photolysis of 1 in the presence of 2,3-dimethyl-1,3-butadiene led to normal silylene-olefin addition and silylene C-H insertion reactions. However, when 2 was photolyzed in a methanol-cyclohexene system, an apparent radical reaction occurred. We suspect that the sulfur atom of the thienyl group strongly stabilizes a silyl radical. This result was supported by both identifying its typical radical reaction products and examining the ESR spectrum of its adduct with a radical trap.

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页码：589 / 597

页数：9

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