AUGER-ELECTRON AND X-RAY PHOTOELECTRON-SPECTROSCOPY OF SPUTTER DEPOSITED ALUMINUM NITRIDE

被引：81

作者：

KOVACICH, JA

KASPERKIEWICZ, J

LICHTMAN, D

AITA, CR

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

[2] UNIV WISCONSIN,DEPT MAT,MILWAUKEE,WI 53201

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 08期

关键词：

D O I：

10.1063/1.333335

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2935 / 2939

页数：5

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