XPS, ELECTRON-SPIN-RESONANCE AND RESISTIVITY MEASUREMENTS ON AMORPHOUS-SILICON OXYNITRIDE FILMS (A-SIOXNY) PREPARED BY REACTIVE EVAPORATION OF SI IN PRESENCE OF NO2

被引：28
作者：
KUBLER, L
HAUG, R
RINGEISEN, F
JAEGLE, A
机构：
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 54卷 / 1-2期
关键词：
D O I：
10.1016/0022-3093(83)90080-7
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
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页码：27 / 42
页数：16
相关论文
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