INSITU GROWTH OF SUPERCONDUCTING YBA2CU3O7-X THIN-FILMS BY A HOT-WALL SPUTTERING PROCESS

被引：7

作者：

LIN, RJ ^{[1
]}

CHEN, LJ ^{[1
]}

机构：

[1] IND TECHNOL RES INST,MAT RES LABS,HSINCHU 310,TAIWAN

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 01期

关键词：

D O I：

10.1063/1.108825

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

YBa2Cu3O7-x (YBCO) superconducting thin films with T(c), of 89 K and J(c) of 2.7 x 10(6) A/cm 2 at 77 K, zero field were prepared by a modified high pressure ( 1. 5 Torr) dc planar diode sputtering process. The design and construction of the simple, economic hot-wall sputtering system which has been achieved in growing high-quality YBCO films on (001)MgO, (001)LaAlO3, and (001)YSZ substrates are reported.

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页码：105 / 107

页数：3

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