Boron Removal from Silicon by CaO-Na2O-SiO2 Ternary Slag

被引：20

作者：

Safarian, Jafar ^{[1
]}

Tranell, Gabriella ^{[2
]}

Tangstad, Merete ^{[2
]}

机构：

[1] SINTEF Mat & Chem, Alfred Getz Vei 2,7465, Trondheim, Norway

[2] Norwegian Univ Sci & Technol NTNU, Dept Mat Sci & Engn, N-7491 Trondheim, Norway

来源：

METALLURGICAL AND MATERIALS TRANSACTIONS E-MATERIALS FOR ENERGY SYSTEMS | 2015年 / 2卷 / 02期

关键词：

D O I：

10.1007/s40553-015-0048-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Boron removal from silicon is an important issue for solar-grade silicon feedstock production. In the present study, the removal of B from liquid silicon by a CaO-Na2O-SiO2 slag is studied and it is shown that B can be rapidly removed from silicon within short refining times. Based on mass balance and chemical analysis of the reacted silicon and slag, it is indicated that the kinetics of B removal is dependent on the Na2O in the slag, the main reactive agent for B removal from the system. The transported B into the slag is gasified at the slag-gas interface through sodium metaborate evaporation, which is a rate controlling reaction for B transport to the gas phase. It is indicated that B removal rate by CaO-Na2O-SiO2 slag is considerably higher than that by CaO-SiO2 slags. It is proposed that boron oxide (B2O3) is better embedded in the structure of CaO-SiO2 slags than Na2O-containing slags.

引用

页码：109 / 118

页数：10

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