STRUCTURE OF REACTIVELY MAGNETRON SPUTTERED HF-N FILMS

被引：49

作者：

JOHANSSON, BO

SUNDGREN, JE

HELMERSSON, U

HIBBS, MK

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 07期

关键词：

D O I：

10.1063/1.94871

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：670 / 672

页数：3

共 8 条

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[2]

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BUNSHAH, RF .

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[4] UNTERSUCHUNGEN IN DEN SYSTEMEN - HAFNIUM-BOR-STICKSTOFF UND ZIRKONIUM-BOR-STICKSTOFF [J].

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[5] CRYSTAL STRUCTURES OF HF3N2 AND HF4N3 [J].

RUDY, E .

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[6] STRUCTURE AND ELECTRICAL PROPERTIES OF SPUTTERED FILMS OF HAFNIUM AND HAFNIUM COMPOUNDS [J].

SMITH, FTJ .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) :4227-&

[7] MECHANISMS OF REACTIVE SPUTTERING OF TITANIUM NITRIDE AND TITANIUM CARBIDE .2. MORPHOLOGY AND STRUCTURE [J].

SUNDGREN, JE ;

JOHANSSON, BO ;

KARLSSON, SE ;

HENTZELL, HTG .

THIN SOLID FILMS, 1983, 105 (04) :367-384

[8]

Toth L.E, 1971, TRANSITION METAL CAR

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