HIGH-RESOLUTION X-RAY-LITHOGRAPHY USING A PHASE MASK

被引：6

作者：

YAMAKOSHI, Y ^{[1
]}

ATODA, N ^{[1
]}

SHIMIZU, K ^{[1
]}

SATO, T ^{[1
]}

SHIMIZU, Y ^{[1
]}

机构：

[1] ELECTROTECH LAB,SAKURA,IBARAKI 305,JAPAN

来源：

APPLIED OPTICS | 1986年 / 25卷 / 06期

关键词：

D O I：

10.1364/AO.25.000928

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：928 / 932

页数：5

共 8 条

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[3]

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[4]

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[7] X-RAY-LITHOGRAPHY SYSTEM - ANALYSIS AND AN OPTIMUM CONSTRUCTION [J].

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SHIMIZU, Y .

APPLIED OPTICS, 1986, 25 (06) :922-927

[8] TRANSFER CHARACTERISTIC FOR A PROJECTION-TYPE IMAGING-SYSTEM WITH AN EXTENDED INCOHERENT SOURCE [J].

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