Columnar structure in anodized porous silicon

被引:0
作者
Aoyagi, H [1 ]
Motohashi, A [1 ]
Kinoshita, A [1 ]
Satoh, A [1 ]
机构
[1] FUJIKURA LTD,TOKYO 135,JAPAN
来源
ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS | 1995年 / 78卷 / 11期
关键词
anodization; porous silicon; structural hierarchy partition; columnar structure;
D O I
10.1002/ecjb.4420781110
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Porous silicon (PS) anodized below a constant temperature, for example 12 degrees C which depends on anodization parameters, is composed of an assemble of columnar shaped sponge like Si. The width of a column is several micrometers, and columns stand almost perpendicular to Si substrate, and the laterals of columns are in contact with each other directly. The average cross-sectional area of columns is related to both the boron density in Si substrate and HF concentration in anodization solution, but is not related to both anodization current density and anodization temperature. The average area of a column is determined such like that only one boron atom exists in an atomic layer in a column. In samples anodized at the temperature around and above 12 degrees C, needle and wall-shaped unanodized crystal Si are observed at the interface between PS columns, respectively.
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页码:98 / 105
页数:8
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