RARE GAS-OXYGEN EFFECTS ON THE RF SPUTTER DEPOSITION OF PLATINUM

被引：17

作者：

AITA, CR

TRAN, NC

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

[2] UNIV WISCONSIN,CTR MAT SCI,MADISON,WI 53706

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 10期

关键词：

D O I：

10.1063/1.331752

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6051 / 6052

页数：2

共 8 条

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AITA, CR ;

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[6]

TAKEUCHI A, UNPUB

[7] INTERNAL-STRESSES IN AMORPHOUS-SILICON FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING USING NE, AR, KR, XE, AND AR+H2 [J].

THORNTON, JA ;

HOFFMAN, DW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :203-207

[8] FORMATION OF PTO FILMS BY REACTIVE SPUTTERING [J].

WESTWOOD, WD ;

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