STRUCTURE OF (SQUARE-ROOT-3 X SQUARE-ROOT-3) R 30-DEGREES-B AT THE SI INTERFACE STUDIED BY GRAZING-INCIDENCE X-RAY-DIFFRACTION

被引:24
作者
AKIMOTO, K
HIROSAWA, I
TATSUMI, T
HIRAYAMA, H
MIZUKI, JI
MATSUI, J
机构
[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba, Ibaraki 305, 34, Miyukigaoka
关键词
D O I
10.1063/1.102522
中图分类号
O59 [应用物理学];
学科分类号
摘要
The boron-induced (7/8 × 7/8) R30°reconstruction at the Si interface has been investigated by grazing incidence x-ray diffraction. The in-plane projected struture is found from the structure factors near zero perpendicular momentum transfer. At the a-Si/Si (111) interface, boron atoms at 1/3 ML are substituted for silicon atoms, thus forming a (7/8 × 7/8) R30°lattice and the boronsilicon bond is contracted compared with the siliconsilicon bond. Even at the interface between a solid phase epitaxial Si (111) layer and a Si (111) substrate, the boron-induced (7/8 × 7/8) R30°reconstruction has also been observed and the structure is similar to that observed at the a-Si/Si (111) interface.
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页码:1225 / 1227
页数:3
相关论文
共 14 条
[1]   INTERFACIAL SUPERSTRUCTURES STUDIED BY GRAZING-INCIDENCE X-RAY-DIFFRACTION [J].
AKIMOTO, K ;
MIZUKI, J ;
HIROSAWA, I ;
MATSUI, J .
APPLIED SURFACE SCIENCE, 1989, 41-2 :317-322
[2]  
AKIMOTO K, 1987, 19TH C SOL STAT DEV, P463
[3]   SURFACE DOPING AND STABILIZATION OF SI(111) WITH BORON [J].
BEDROSSIAN, P ;
MEADE, RD ;
MORTENSEN, K ;
CHEN, DM ;
GOLOVCHENKO, JA ;
VANDERBILT, D .
PHYSICAL REVIEW LETTERS, 1989, 63 (12) :1257-1260
[4]   PRESERVATION OF A 7 X 7 PERIODICITY AT A BURIED AMORPHOUS-SI/SI(111) INTERFACE [J].
GIBSON, JM ;
GOSSMANN, HJ ;
BEAN, JC ;
TUNG, RT ;
FELDMAN, LC .
PHYSICAL REVIEW LETTERS, 1986, 56 (04) :355-358
[5]   STRUCTURE DETERMINATION OF THE SI(111) - B(SQUARE-ROOT-3 X SQUARE-ROOT-3)R 30-DEGREES SURFACE - SUBSURFACE SUBSTITUTIONAL DOPING [J].
HEADRICK, RL ;
ROBINSON, IK ;
VLIEG, E ;
FELDMAN, LC .
PHYSICAL REVIEW LETTERS, 1989, 63 (12) :1253-1256
[6]   STABILITY OF BORON-INDUCED AND GALLIUM-INDUCED SURFACE-STRUCTURES ON SI(111) DURING DEPOSITION AND EPITAXIAL-GROWTH OF SILICON [J].
HEADRICK, RL ;
FELDMAN, LC ;
ROBINSON, IK .
APPLIED PHYSICS LETTERS, 1989, 55 (05) :442-444
[7]   REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND AUGER-ELECTRON SPECTROSCOPIC STUDY ON B/SI(111) SURFACES [J].
HIRAYAMA, H ;
TATSUMI, T ;
AIZAKI, N .
SURFACE SCIENCE, 1988, 193 (1-2) :L47-L52
[8]   FORMATION OF SI(111)SQUARE-ROOT-3 X SQUARE-ROOT-3-B AND SI EPITAXY ON SI(111)SQUARE-ROOT-3 X SQUARE-ROOT-3-B - LEED AES STUDY [J].
KOROBTSOV, VV ;
LIFSHITS, VG ;
ZOTOV, AV .
SURFACE SCIENCE, 1988, 195 (03) :466-474
[9]   NONRANDOM DOPING AND ELASTIC-SCATTERING OF CARRIERS IN SEMICONDUCTORS [J].
LEVI, AFJ ;
MCCALL, SL ;
PLATZMAN, PM .
APPLIED PHYSICS LETTERS, 1989, 54 (10) :940-942
[10]  
LORRETTO D, 1989, PHYS REV LETT, V63, P298