ELECTROOPTIC CHARACTERIZATION OF ION-BEAM SPUTTER-DEPOSITED KNBO3 THIN-FILMS

被引：45

作者：

GRAETTINGER, TM ^{[1
]}

ROU, SH ^{[1
]}

AMEEN, MS ^{[1
]}

AUCIELLO, O ^{[1
]}

KINGON, AI ^{[1
]}

机构：

[1] MICROELECTR CTR N CAROLINA,RES TRIANGLE PK,NC 27709

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 18期

关键词：

D O I：

10.1063/1.105033

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The electro-optic properties of potassium niobate thin films deposited using a computer-controlled ion beam sputtering technique have been studied for the first time. Epitaxial and polycrystalline films were deposited on single crystal magnesium oxide and highly (111) oriented films were deposited on sapphire for the study. All films exhibited a quadratic-like dependence of birefringence shift on the applied electric field. The microstructure of the films and its relation to the observed electro-optic properties is discussed.

引用

页码：1964 / 1966

页数：3

共 12 条

[1] ELECTROOPTIC EFFECTS OF (PB, LA)(ZR, TI)O3 THIN-FILMS PREPARED BY RF PLANAR MAGNETRON SPUTTERING [J].

ADACHI, H ;

KAWAGUCHI, T ;

SETSUNE, K ;

OHJI, K ;

WASA, K .

APPLIED PHYSICS LETTERS, 1983, 42 (10) :867-868

[2] FERROELECTRIC (PB,LA)(ZR,TI)O3 EPITAXIAL THIN-FILMS ON SAPPHIRE GROWN BY RF-PLANAR MAGNETRON SPUTTERING [J].

ADACHI, H ;

MITSUYU, T ;

YAMAZAKI, O ;

WASA, K .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (02) :736-741

[3]

Holman R.L., 1986, 6TH P IEEE INT S APP, P32

[4] EPITAXIAL-GROWTH OF FERROELECTRIC PLZT [(PB,LA)(ZR,TI)O3] THIN-FILMS [J].

ISHIDA, M ;

TSUJI, S ;

KIMURA, K ;

MATSUNAMI, H ;

TANAKA, T .

JOURNAL OF CRYSTAL GROWTH, 1978, 45 (01) :393-398

[5]

Kingon A. I., 1990, CERAMIC T, V14, P179

[6]

KINGON AI, 1990, IN PRESS J FERROELEC

[7]

ROU SH, 1990, MATER RES SOC SYMP P, V183, P285, DOI 10.1557/PROC-183-285

[8]

ROU SH, 1990, ELECTRON MICROS, V4, P466

[9]

ROU SH, UNPUB

[10]

TUTTLE BA, 1987, MRS B 1001, P40

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