POTENTIAL BARRIER PARAMETERS IN THIN-FILM AL-AL2O3-METAL DIODES

被引：66

作者：

NELSON, OL

ANDERSON, DE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1966年 / 37卷 / 01期

关键词：

D O I：

10.1063/1.1707894

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：77 / &

共 25 条

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