ELASTIC STRAIN AND MISFIT DISLOCATION DENSITY IN SI0.92GE0.08 FILMS ON SILICON SUBSTRATES

被引:140
作者
KASPER, E [1 ]
HERZOG, HJ [1 ]
机构
[1] FORSCH INST ULM,AEG TELEFUNKEN,ULM,FED REP GER
关键词
D O I
10.1016/0040-6090(77)90443-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:357 / 370
页数:14
相关论文
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