T1-XALXN COATINGS BY PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION USING A TICL4/ALCL3/N-2/H-2/AR GAS-MIXTURE

被引：14
作者：
KIM, KH
LEE, SH
机构：
[1] Department of Inorganic Materials Engineering, Pusan National University, Pusan
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1995年 / 14卷 / 21期
关键词：
D O I：
10.1007/BF00633152
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：1531 / 1533
页数：3
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