X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSIS OF BUFFED POLYIMIDE FILM

被引：1
|
作者：
HAYASHI, Y
MATSUMOTO, K
机构：
来源：
NIPPON KAGAKU KAISHI | 1994年 / 05期
关键词：
D O I：
10.1246/nikkashi.1994.490
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Changes in surface structure of polyimide films by the buffing process are investigated. In general, liquid crystal materials can be homogeneously aligned by buffed thin films of appropriate polymer, such as polyimide, but the mechanism is not clear. In this study, X-ray photoelectron spectroscopy (XPS) analysis based on a molecular orbital calculation has been succcesfully applied to determine the chemical bonding state of the polyimide surface. On the basis of the XPS analysis, it is found that the imide ring moiety is selectively modified by the buffing process.
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页码：490 / 492
页数：3
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