PROPERTIES OF TIO2 AND SIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION

被引：53

作者：

MCNEIL, JR

ALJUMAILY, GA

JUNGLING, KC

BARRON, AC

机构：

来源：

APPLIED OPTICS | 1985年 / 24卷 / 04期

关键词：

D O I：

10.1364/AO.24.000486

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：486 / 489

页数：4

共 7 条

[1]

ALLEN TH, 1982, P SOC PHOTO-OPT INST, V325, P93, DOI 10.1117/12.933291

[2]

HERRMANN WC, 1982, P SOC PHOTO-OPT INST, V325, P101, DOI 10.1117/12.933292

[3]

Kelly R., 1970, Atomic collision phenomena in solids, P172

[4] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J].

MARTIN, PJ ;

MACLEOD, HA ;

NETTERFIELD, RP ;

PACEY, CG ;

SAINTY, WG .

APPLIED OPTICS, 1983, 22 (01) :178-184

[5] ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS [J].

MARTIN, PJ ;

NETTERFIELD, RP ;

SAINTY, WG ;

CLARK, GJ ;

LANFORD, WA ;

SIE, SH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :711-713

[6] SURFACE SMOOTHING EFFECTS OF THIN-FILM DEPOSITION [J].

MCNEIL, JR ;

WEI, LJ ;

ALJUMAILY, GA ;

SHAKIR, S ;

MCIVER, JK .

APPLIED OPTICS, 1985, 24 (04) :480-485

[7]

MCNEIT JR, 1984, APPL OPTICS, V23, P559

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