A NOVEL HIGH-SPEED NANOMETRIC ELECTRON-BEAM LITHOGRAPHY SYSTEM - EB-F

被引：9
|
作者：
IWADATE, K
YAMAGUCHI, R
HIRATA, K
HARADA, K
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词：
D O I：
10.1116/1.583931
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：75 / 78
页数：4
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