THE STUDY OF THE BORON-NITRIDE THIN-LAYER STRUCTURE

The structure of thin layers of boron nitride obtained by low temperature plasma enhanced chemical vapour deposition of borazine as precursor has been investigated by X-ray diffraction method. The diffraction pattern consists of the superposition of the three patterns: from non-crystalline turbostrate am-BN, from polycrystalline h-BN and c-BN. The sizes of intermolecular (nucleus surrounded by ''fringe''), 14.8 Angstrom, and intramolecular (nucleus), 7.6 Angstrom, formations are evaluated from the reflection positions in non-crystalline stare and confirmed by calculation. Polycrystalline reflections from h-BN and c-BN are in accordance with known ones for these modifications.