ANISOTROPIC VACANCY KINETICS AND SINGLE-DOMAIN STABILIZATION ON SI(100)-2X1

被引:90
作者
BEDROSSIAN, P [1 ]
KLITSNER, T [1 ]
机构
[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185
关键词
D O I
10.1103/PhysRevLett.68.646
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Preferential annihilation of mobile surface vacancies at the ends, rather than the sides of dimer rows leads to a new, nonequilibrium, single-domain phase of Si(100) that is not accessible by epitaxial growth but is stable at moderate temperatures (T approximately 450-degrees-C). These results emerge from a tunneling microscope study of layer-by-layer removal of Si from Si(100) under 225-eV Xe-ion bombardment.
引用
收藏
页码:646 / 649
页数:4
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