DIRECT-ETCHING STUDIES OF POLYMER-FILMS USING A 157-NM F2 LASER

被引：46

作者：

DYER, PE

SIDHU, J

机构：

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 1986年 / 3卷 / 05期

关键词：

D O I：

10.1364/JOSAB.3.000792

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：792 / 795

页数：4

共 16 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] THE OPTICAL-PROPERTIES OF KAPTON - MEASUREMENT AND APPLICATIONS [J].

ARAKAWA, ET ;

WILLIAMS, MW ;

ASHLEY, JC ;

PAINTER, LR .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) :3579-3582

[3]

BECK R, 1980, TABLE LASER LINES GA

[4] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].

DEUTSCH, TF ;

GEIS, MW .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204

[5] EXCIMER LASER PROJECTION MICROMACHINED FREESTANDING POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

OPTICS AND LASERS IN ENGINEERING, 1985, 6 (02) :67-77

[6] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[7]

DYER PE, 1984, C LASERS ELECTROOPTI

[8]

GORDETSKY G, 1985, APPL PHYS LETT, V46, P828

[9] SELF-DEVELOPING PHOTORESIST USING A VACUUM ULTRAVIOLET F2 EXCIMER LASER EXPOSURE [J].

HENDERSON, D ;

WHITE, JC ;

CRAIGHEAD, HG ;

ADESIDA, I .

APPLIED PHYSICS LETTERS, 1985, 46 (09) :900-902

[10] EMISSION-SPECTRA, SURFACE QUALITY, AND MECHANISM OF EXCIMER LASER ETCHING OF POLYIMIDE FILMS [J].

KOREN, G ;

YEH, JTC .

APPLIED PHYSICS LETTERS, 1984, 44 (12) :1112-1114

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