MECHANISMS OF AL FILM GROWTH BY ULTRAVIOLET-LASER PHOTOLYSIS OF TRIMETHYLALUMINUM

被引：33
|
作者：
MOTOOKA, T [1 ]
GORBATKIN, S [1 ]
LUBBEN, D [1 ]
ERES, D [1 ]
GREENE, JE [1 ]
机构：
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期
关键词：
D O I：
10.1116/1.573644
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：3146 / 3152
页数：7
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