REPRODUCIBILITY OF PROPERTIES OF SNOX THIN-FILMS PREPARED BY REACTIVE SPUTTERING

被引：2

作者：

BEENSHMARCHWICKA, G

KROLSTEPNIEWSKA, L

机构：

来源：

ELECTROCOMPONENT SCIENCE AND TECHNOLOGY | 1985年 / 11卷 / 04期

关键词：

D O I：

10.1155/APEC.11.271

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：271 / 280

页数：10

共 13 条

[1]

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[2]

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[3]

JARZEBSKI ZM, 1976, J ELECTROCHEM SOC, pC333

[4] PREPARATION AND PROPERTIES OF REACTIVELY CO-SPUTTERED TRANSPARENT CONDUCTING FILMS [J].

LEHMANN, HW ;

WIDMER, R .

THIN SOLID FILMS, 1975, 27 (02) :359-368

[5] ELECTRICAL-PROPERTIES OF NONSTOICHIOMETRIC TIN OXIDE-FILMS OBTAINED BY THE DC REACTIVE SPUTTERING METHOD [J].

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PISARKIEWICZ, T ;

KOLODZIEJ, A .

THIN SOLID FILMS, 1980, 67 (01) :45-48

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MENDRELA E, 1978, PR NAUK I TECHNOL EL, V21, P109

[7] 2-STEP PROCESS FOR THIN-FILMS OF TIN DIOXIDE [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1565-1567

[8] EFFECT OF SUBSTRATE TEMPERATURE ON DC-SPUTTERED ANTIMONY-DOPED TIN-DIOXIDE FILMS [J].

SABNIS, AG ;

CHANG, KY .

ELECTRONICS LETTERS, 1977, 13 (04) :113-114

[9] CORRESPONDENCE BETWEEN ANTIMONY CONTENTS OF SPUTTERED FILMS AND TARGETS [J].

SABNIS, AG ;

MOLDOVAN, AG .

APPLIED PHYSICS LETTERS, 1978, 33 (10) :885-886

[10] HEAT-TREATMENT OF DC-SPUTTERED TIN DIOXIDE THIN-FILMS [J].

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FEISEL, LD .

IEEE TRANSACTIONS ON PARTS HYBRIDS AND PACKAGING, 1976, 12 (04) :357-360

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