TEMPERATURE-DEPENDENCE OF SEMICONDUCTING AND STRUCTURAL-PROPERTIES OF CR-SI THIN-FILMS

被引：73
作者：
NAVA, F [1 ]
TIEN, T [1 ]
TU, KN [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 06期
关键词：
D O I：
10.1063/1.334389
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2018 / 2025
页数：8
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