STUDIES OF OPTIMUM CONDITIONS FOR GROWTH OF RF-SPUTTERED ZNO FILMS

被引：81

作者：

KHURIYAKUB, BT ^{[1
]}

KINO, GS ^{[1
]}

GALLE, P ^{[1
]}

机构：

[1] STANFORD UNIV,MICROWAVE LAB,STANFORD,CA 94305

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 08期

关键词：

D O I：

10.1063/1.322054

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3266 / 3272

页数：7

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[9] CHARACTERIZATION OF PIEZOELECTRIC TRANSDUCERS USED IN ULTRASONIC DEVICES OPERATING ABOVE 0.1 GHZ [J].

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