X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE NI/SI OXIDE/SI INTERFACE

被引：10

作者：

DILLINGHAM, TR ^{[1
]}

CHOURASIA, AR ^{[1
]}

CHOPRA, DR ^{[1
]}

MARTIN, SR ^{[1
]}

PETERSON, KL ^{[1
]}

HU, CZ ^{[1
]}

GNADE, B ^{[1
]}

机构：

[1] TEXAS INSTRUMENTS INC,MAT SCI LAB,DALLAS,TX 75265

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 06期

关键词：

D O I：

10.1116/1.574193

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3340 / 3345

页数：6

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