X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE NI/SI OXIDE/SI INTERFACE

被引：10

作者：

DILLINGHAM, TR ^{[1
]}

CHOURASIA, AR ^{[1
]}

CHOPRA, DR ^{[1
]}

MARTIN, SR ^{[1
]}

PETERSON, KL ^{[1
]}

HU, CZ ^{[1
]}

GNADE, B ^{[1
]}

机构：

[1] TEXAS INSTRUMENTS INC,MAT SCI LAB,DALLAS,TX 75265

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 06期

关键词：

D O I：

10.1116/1.574193

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3340 / 3345

页数：6

共 50 条

[21] Strained Si layers at dielectric/Si(100) interface probed by X-ray photoelectron spectroscopy [J].

Lu, ZH ;

Ma, Y ;

Li, F ;

Liu, CT .

PHYSICS AND CHEMISTRY OF SIO2 AND THE SI-SIO2 INTERFACE - 4, 2000, 2000 (02) :453-457

[22] X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

WATTS, JF .

VACUUM, 1994, 45 (6-7) :653-671

[23] X-RAY PHOTOELECTRON-SPECTROSCOPY [J].

DOMEN, K .

DENKI KAGAKU, 1991, 59 (08) :673-678

[24] X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY ON ZEOLITES [J].

TEMPERE, JF ;

DELAFOSSE, D ;

CONTOUR, JP .

CHEMICAL PHYSICS LETTERS, 1975, 33 (01) :95-98

[25] X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE INTERACTION OF ALCOHOLS WITH OXIDE SURFACES [J].

TOBIN, J ;

HIRSCHWALD, W ;

CUNNINGHAM, J .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1985, 40 (5-6) :725-737

[26] X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSIS OF THE GROWTH-KINETICS OF GE ON SI(001) [J].

RICHMOND, ED .

THIN SOLID FILMS, 1994, 252 (02) :98-104

[27] X-RAY PHOTOELECTRON-SPECTROSCOPY OF SIO2-SI INTERFACIAL REGIONS - ULTRATHIN OXIDE-FILMS [J].

RAIDER, SI ;

FLITSCH, R .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1978, 22 (03) :294-303

[28] The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy [J].

Yu, T. ;

Jin, C. G. ;

Yang, X. M. ;

Wu, X. M. ;

Zhuge, L. J. ;

Ge, S. B. .

SURFACE AND INTERFACE ANALYSIS, 2012, 44 (04) :395-398

[29] X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF RADIATION-DAMAGED SI-SIO2 INTERFACES [J].

BERTRAND, PA ;

FLEISCHAUER, PD ;

SONG, Y .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (02) :1100-1103

[30] X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF SUBMONOLAYER NATIVE OXIDES ON HF-TREATED SI SURFACES [J].

YANO, F ;

HIRAOKA, A ;

ITOGA, T ;

KOJIMA, H ;

KANEHORI, K ;

MITSUI, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (06) :2671-2675

← 1 2 3 4 5 →