COMPARISON OF INSITU LOW-PRESSURE OXIDATION OF PURE IRON AT ROOM-TEMPERATURE IN O2 AND IN O2/H2O MIXTURES USING XPS

被引：40

作者：

STAMBOULI, V

PALACIO, C

MATHIEU, HJ

LANDOLT, D

机构：

[1] Département des matériaux, LMCH, Ecole Polytechnique Fédérale de Lausanne

来源：

APPLIED SURFACE SCIENCE | 1993年 / 70-1卷

关键词：

D O I：

10.1016/0169-4332(93)90435-E

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Low-pressure (10(-6)-10(-8) Torr) in-situ oxidation of Fe by 02 and 02 plus H2O at room temperature has been studied by X-ray photoelectron spectroscopy. Non-linear least-squares fitting routines are applied to determine the thin oxide film composition. For exposures from 1 to 10(4) L pure iron oxidation leads to a Fe2O3 layer on top of FeO. No or little FeOOH formation is observed. Some OH- is adsorbed at the surface. Exposure to a mixture of H2O + 02 (50/50) does not influence the composition of the oxide film.

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页码：240 / 244

页数：5

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