PROPERTIES OF RF-SPUTTERED BERYLLIUM THIN-FILMS

被引:2
作者
PAULSON, WM [1 ]
LORIGAN, RP [1 ]
机构
[1] MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期
关键词
D O I
10.1116/1.569124
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:210 / 218
页数:9
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