EXPERIMENTAL SCANNING ELECTRON-BEAM AUTOMATIC REGISTRATION SYSTEM

被引：36

作者：

WILSON, AD ^{[1
]}

CHANG, THP ^{[1
]}

KERN, A ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568506

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1240 / 1245

页数：6

共 10 条

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ALLES DS, 1975, 13TH P S EL ION PHOT

[2]

BEASLEY JP, 1975, 13TH P S EL ION PHOT

[3]

CHANG THP, 1975, 13TH P S EL ION PHOT

[4]

CHANG THP, 1974, 8TH P INT C EL MICR, V1, P650

[5]

CHANG THP, 1974, 6TH EL ION BEAM SCI, P580

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[8] COMPUTER-CONTROLLED ELECTRON-BEAM MICROFABRICATION MACHINE WITH A NEW REGISTRATION SYSTEM [J].

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[9] E-BEAM WRITING TECHNIQUES FOR SEMICONDUCTOR-DEVICE FABRICATION [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1048-1051

[10]

Wells OC, 1974, SCANNING ELECTRON MI, P20

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