COMPUTER-SIMULATION OF A CF4 PLASMA-ETCHING SILICON

被引：158

作者：

EDELSON, D

FLAMM, DL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 05期

关键词：

D O I：

10.1063/1.334108

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1522 / 1531

页数：10

共 38 条

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