COMPUTER-SIMULATION OF A CF4 PLASMA-ETCHING SILICON

[1] IONIZATION AND DISSOCIATION IN SOME FLUOROCARBON GASES [J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1963, 59 (491): : 2455 - &

[2] BROWN SC, 1966, INTRO ELECTRICAL DIS

[3] CHRISTOPHOROU LG, 1982, ORNLTM8368 REP

[4] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3532 - 3540

[5] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 353 - 356

[6] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275

[7] DETTMER JW, AFITDS783 AIR FORC I

[8] LASER DIAGNOSTICS OF PLASMA-ETCHING - MEASUREMENT OF CL2+ IN A CHLORINE DISCHARGE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 817 - 823

[9] EDELSON D, 1981, SCIENCE, V214, P981, DOI 10.1126/science.214.4524.981

[10] SIMULATION LANGUAGE AND COMPILER TO AID COMPUTER SOLUTION OF CHEMICAL KINETIC PROBLEMS [J]. COMPUTERS & CHEMISTRY, 1976, 1 (01): : 29 - 33

[1] IONIZATION AND DISSOCIATION IN SOME FLUOROCARBON GASES [J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1963, 59 (491): : 2455 - &

[2] BROWN SC, 1966, INTRO ELECTRICAL DIS

[3] CHRISTOPHOROU LG, 1982, ORNLTM8368 REP

[4] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3532 - 3540

[5] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 353 - 356

[6] EVIDENCE FOR A TIME-DEPENDENT EXCITATION PROCESS IN SILANE RADIO-FREQUENCY GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) : 2272 - 2275

[7] DETTMER JW, AFITDS783 AIR FORC I

[8] LASER DIAGNOSTICS OF PLASMA-ETCHING - MEASUREMENT OF CL2+ IN A CHLORINE DISCHARGE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 817 - 823

[9] EDELSON D, 1981, SCIENCE, V214, P981, DOI 10.1126/science.214.4524.981

[10] SIMULATION LANGUAGE AND COMPILER TO AID COMPUTER SOLUTION OF CHEMICAL KINETIC PROBLEMS [J]. COMPUTERS & CHEMISTRY, 1976, 1 (01): : 29 - 33