EFFECT OF SILANE DILUTION ON INTRINSIC STRESS IN GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON FILMS

被引：63
作者：
HARBISON, JP
WILLIAMS, AJ
LANG, DV
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 04期
关键词：
D O I：
10.1063/1.333148
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：946 / 951
页数：6
相关论文
共 35 条
[1]  
BLACKBURN H, 1961, 8 T NAT VAC S, V2, P943
[2]   CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].
BRENNER, A ;
SENDEROFF, S .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123
[3]   QUANTITATIVE-ANALYSIS OF HYDROGEN IN GLOW-DISCHARGE AMORPHOUS SILICON [J].
BRODSKY, MH ;
FRISCH, MA ;
ZIEGLER, JF ;
LANFORD, WA .
APPLIED PHYSICS LETTERS, 1977, 30 (11) :561-563
[4]  
CAMBEL DS, 1970, HDB THIN FILM TECHNO, pCH12
[5]   SIMS ANALYSIS OF DEUTERIUM DIFFUSION IN HYDROGENATED AMORPHOUS SILICON [J].
CARLSON, DE ;
MAGEE, CW .
APPLIED PHYSICS LETTERS, 1978, 33 (01) :81-83
[6]   OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].
COBURN, JW ;
CHEN, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136
[7]   SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J].
DAGOSTINO, R ;
CRAMAROSSA, F ;
DEBENEDICTIS, S ;
FERRARO, G .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :1259-1265
[8]   SMALL-ANGLE-SCATTERING EVIDENCE OF VOIDS IN HYDROGENATED AMORPHOUS SILICON [J].
DANTONIO, P ;
KONNERT, JH .
PHYSICAL REVIEW LETTERS, 1979, 43 (16) :1161-1163
[9]   COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J].
DIRKS, AG ;
LEAMY, HJ .
THIN SOLID FILMS, 1977, 47 (03) :219-233
[10]   EFFECT OF STRUCTURE AND IMPURITIES ON THE EPITAXIAL REGROWTH OF AMORPHOUS-SILICON [J].
FOTI, G ;
BEAN, JC ;
POATE, JM ;
MAGEE, CW .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :840-842
1234