THERMAL-STABILITY AND ELECTRICAL-RESISTIVITY OF N-14-IMPLANTED NICKEL CONTACTS ON N+-SI

被引：6

作者：

BANWELL, T ^{[1
]}

NICOLET, MA ^{[1
]}

SCOTT, DM ^{[1
]}

机构：

[1] UNIV CALIF SAN DIEGO,LA JOLLA,CA 92093

来源：

THIN SOLID FILMS | 1983年 / 107卷 / 01期

关键词：

D O I：

10.1016/0040-6090(83)90008-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：67 / 71

页数：5

共 18 条

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[10] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].

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