THERMAL AND ELECTRON-BEAM-INDUCED REACTION OF DISILANE ON SI(100)-(2X1)

被引:75
|
作者
BOZSO, F
AVOURIS, P
机构
来源
PHYSICAL REVIEW B | 1988年 / 38卷 / 06期
关键词
D O I
10.1103/PhysRevB.38.3943
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:3943 / 3947
页数:5
相关论文
共 50 条
  • [31] THERMAL AMPLITUDES OF SURFACE ATOMS ON SI(111) 2X1 AND SI(001) 2X1
    ALERHAND, OL
    JOANNOPOULOS, JD
    MELE, EJ
    PHYSICAL REVIEW B, 1989, 39 (17): : 12622 - 12629
  • [32] ELECTRONIC EXCITATIONS ON SI(100)(2X1)
    FARRELL, HH
    STUCKI, F
    ANDERSON, J
    FRANKEL, DJ
    LAPEYRE, GJ
    LEVINSON, M
    PHYSICAL REVIEW B, 1984, 30 (02): : 721 - 725
  • [33] CS ADSORPTION ON SI(100)2X1
    PAPAGEORGOPOULOS, CA
    COUSTY, J
    RIWAN, R
    VACUUM, 1990, 41 (1-3) : 578 - 579
  • [34] BA DEPOSITION ON SI(100)2X1
    VLACHOS, D
    KAMARATOS, M
    PAPAGEORGOPOULOS, C
    SOLID STATE COMMUNICATIONS, 1994, 90 (03) : 175 - 181
  • [35] THE GROWTH OF AG ON SI(100)-2X1
    BORENSZTEIN, Y
    ALAMEH, R
    APPLIED SURFACE SCIENCE, 1993, 65-6 : 735 - 741
  • [36] VACANCY DIFFUSION ON SI(100)-(2X1)
    ZHANG, ZY
    CHEN, H
    BOLDING, BC
    LAGALLY, MG
    PHYSICAL REVIEW LETTERS, 1993, 71 (22) : 3677 - 3680
  • [37] Modelling the interaction of silane and disilane with Si{100}(2x1) using classical many-body potentials
    Smith, R
    Rhodes, PE
    Walls, JM
    COMPUTATIONAL MATERIALS SCIENCE, 1998, 11 (01) : 65 - 73
  • [38] Coverage-dependent thermal reactions of digermane on Si(100)-(2x1)
    Lin, D.-S.
    Huang, K.-H.
    Pi, T.-W.
    Wu, R.-T.
    Physical Review B: Condensed Matter, 54 (23):
  • [39] Coverage-dependent thermal reactions of digermane on Si(100)-(2x1)
    Lin, DS
    Huang, KH
    Pi, TW
    Wu, RT
    PHYSICAL REVIEW B, 1996, 54 (23): : 16958 - 16964
  • [40] Electron-beam-induced fragmentation in ultrathin C60 films on Si(100)-2x1-H:: Mechanisms of cage destruction
    Hunt, MRC
    Schmidt, J
    Palmer, RE
    PHYSICAL REVIEW B, 1999, 60 (08) : 5927 - 5937