NUMERICAL-SIMULATION OF STATIC AND DYNAMIC CHARACTERISTICS OF DUAL-GATE METAL-OXIDE-SEMICONDUCTOR THYRISTOR

被引:0
作者
IWAMURO, N
SEKI, Y
机构
[1] Fuji Electric Corporate R D Ltd., Advanced Device Technology Laboratory, Matsumoto-shi, Nagano, 390
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1995年 / 34卷 / 3A期
关键词
POWER SEMICONDUCTOR DEVICES; MOS-GATED THYRISTORS; VERTICAL STRUCTURE; IGBTS; DUAL-GATE OPERATION; LOW ONSTATE VOLTAGE DROP; FAST SWITCHING SPEED;
D O I
10.1143/JJAP.34.L285
中图分类号
O59 [应用物理学];
学科分类号
摘要
Static and dynamic characteristics of a newly proposed vertical metal oxide semiconductor (MOS)-gated thyristor structure called the dual-gate MOS thyristor (DGMOT) are reported for the first time. The feature of this device is that IGBT mode turn-off is achieved due to a novel integration of a lateral n-metal oxide semiconductor field effect transistor (MOSFET) with the thyristor structure while the thyristor mode operation is achieved in the on state. It is possible to obtain a lower on-state voltage drop in the DGMOT while preserving its fast turn-off speed. It has been numerically demonstrated using 600 V forward blocking devices that the on-state voltage drop of 1.04 V and the turn-off time of 0.40 mu s are achieved. This result suggests that the DGMOT could be a superior alternative to the power bipolar junction transistor and may expand the application fields of the MOS-gated devices to the low-frequency operation circuit.
引用
收藏
页码:L285 / L287
页数:3
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