A GAAS JUNCTION-GATE FECFET (J-FECFET) FOR THE DIGITAL INTEGRATED-CIRCUITS

被引:3
|
作者
KIM, CT
LEE, YJ
KWON, YS
机构
[1] Department of Electrical Engineering, Korea Advanced Institute of Science and Technology, Yusung Gu, Taejon, 373-1, Kusung Dong
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 1B期
关键词
J-FECFET; SELECTIVE MOCVD; DCFL; SIDEGATE EFFECT;
D O I
10.1143/JJAP.32.556
中图分类号
O59 [应用物理学];
学科分类号
摘要
We proposed and fabricated a new GaAs Junction-gate floated electron channel FET (J-FECFET) as a unit device for realizing the direct coupled FET logic circuit. By varying the active channel thickness with different mask stripe width in selective MOCVD, we show that the threshold voltages of the fabricated J-FECFET's can be controlled. The enhancement-mode J-FECFET demonstrates the maximum extrinsic transconductance of 350 mS/mm with the threshold voltage of -0.1 V. The depletion-mode J-FECFET's with the higher threshold voltages of -1.67 V and -4.0 V are obtained by reducing the mask stripe width. Negligible sidegate effect is observed in the fabricated J-FECFET.
引用
收藏
页码:556 / 559
页数:4
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