OHMIC AND SCHOTTKY CONTACTS ON PHOTOCHEMICALLY PASSIVATED N-GAAS SURFACES

被引:1
|
作者
PRASAD, K
FARAONE, L
NASSIBIAN, AG
机构
[1] Department of Electrical and Electronic Engineering, The University of Western Australia, Nedlands
基金
澳大利亚研究理事会;
关键词
D O I
10.1016/0040-6090(91)90290-E
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
AuGe/Ni ohmic and titanium Schottky contacts were formed on n-GaAs surfaces which had undergone photochemical passivation prior to metal (ohmic and Schottky) deposition. Electrical measurements of ohmic and Schottky contacts indicate that photochemical passivation results in more stable and repeatable GaAs surfaces properties. Ohmic contacts on photochemically passivated surfaces reveal a greater degree of uniformity across the sample and from sample to sample even though there is no significant change in the mean specific contact resistance ρ{variant}c values compared with samples which were not passivated. Electrical characterization of Schottky contacts showed that photochemically passivated GaAs surfaces exhibited lower leakage currents and interface state densities than Schottky contacts formed on unpassivated GaAs surfaces. © 1991.
引用
收藏
页码:L11 / L16
页数:6
相关论文
共 50 条
  • [31] Thermal stability of rapidly annealed ruthenium n-GaAs Schottky contacts
    Eftekhari, Ghader
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (5 S): : 1934 - 1935
  • [32] MECHANISM FOR NEARLY OHMIC BEHAVIOR IN ANNEALED AU/N-GAAS SCHOTTKY DIODES
    LEON, RP
    NEWMAN, N
    LILIENTALWEBER, Z
    WEBER, ER
    WASHBURN, J
    SPICER, WE
    JOURNAL OF APPLIED PHYSICS, 1989, 66 (02) : 711 - 715
  • [33] CHARACTERISTICS OF BETA-PHASE PDAL SCHOTTKY CONTACTS TO N-GAAS
    HUANG, TS
    PANG, JG
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (09) : 5739 - 5744
  • [34] SCHOTTKY DIODES ON HYDROGEN PLASMA TREATED N-GAAS SURFACES
    PACCAGNELLA, A
    CALLEGARI, A
    LATTA, E
    GASSER, M
    APPLIED PHYSICS LETTERS, 1989, 55 (03) : 259 - 261
  • [35] NONALLOYED OHMIC CONTACTS TO N-GAAS USING EPITAXIAL N-GE LAYER
    PAI, CS
    SAWADA, T
    MARSHALL, ED
    CHEN, WX
    LAU, SS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (06) : C221 - C221
  • [36] STABLE OHMIC CONTACTS TO N-GAAS USING ION-BEAM MIXING
    SMITH, SR
    SOLOMON, JS
    MATERIALS LETTERS, 1985, 3 (7-8) : 294 - 298
  • [37] METAL PENETRATION AND DOPANT REDISTRIBUTION BENEATH ALLOYED OHMIC CONTACTS TO N-GAAS
    SHAPPIRIO, JR
    LAREAU, RT
    LUX, RA
    FINNEGAN, JJ
    SMITH, DD
    HEATH, LS
    TAYSINGLARA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1503 - 1507
  • [38] Interfacial reactions of Ni-In and Ni/In/Ni ohmic contacts to n-GaAs
    1600, American Inst of Physics, Woodbury, NY, USA (78):
  • [39] Low resistance ohmic contacts to n-GaAs for application in GaAs/AlGaAs quantum cascade lasers
    Karbownik, Piotr
    Baranska, Anna
    Szerling, Anna
    Macherzynski, Wojciech
    Papis, Ewa
    Kosiel, Kamil
    Bugajski, Maciej
    Tlaczala, Marek
    Jakiela, Rafal
    OPTICA APPLICATA, 2009, 39 (04) : 655 - 661
  • [40] Thermally stable PdIn ohmic contacts to n-GaAs via exchange mechanism
    Chen, DY
    Chang, YA
    Swenson, D
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (01) : 297 - 300