ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF XEF LASER

被引：45

作者：

MANGANO, JA ^{[1
]}

JACOB, JH ^{[1
]}

DODGE, JB ^{[1
]}

机构：

[1] AVCO CORP,EVERETT RES LAB,EVERETT,MA 02149

来源：

APPLIED PHYSICS LETTERS | 1976年 / 29卷 / 07期

关键词：

D O I：

10.1063/1.89106

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：426 / 428

页数：3

共 16 条

[1]

AULT ER, 1975, APPL PHYS LETT, V27, P412

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[3] 354-NM LASER ACTION ON XEF [J].

BRAU, CA ;

EWING, JJ .

APPLIED PHYSICS LETTERS, 1975, 27 (08) :435-437

[4]

BRAU CA, UNPUBLISHED

[5] XENON FLUORIDE LASER EXCITATION BY TRANSVERSE ELECTRIC-DISCHARGE [J].

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HARRIS, NW ;

DJEU, N .

APPLIED PHYSICS LETTERS, 1976, 28 (02) :86-87

[6] ATTACHMENT-DOMINATED ELECTRON-BEAM-IONIZED DISCHARGES [J].

DAUGHERTY, JD ;

MANGANO, JA ;

JACOB, JH .

APPLIED PHYSICS LETTERS, 1976, 28 (10) :581-583

[7] DISCHARGE PUMPING OF BR2 LASER [J].

EWING, JJ ;

JACOB, JH ;

MANGANO, JA ;

BROWN, HA .

APPLIED PHYSICS LETTERS, 1976, 28 (11) :656-659

[8] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

[9]

HYMAN H, COMMUNICATION

[10] MODELING KRF LASER DISCHARGE [J].

JACOB, JH ;

MANGANO, JA .

APPLIED PHYSICS LETTERS, 1976, 28 (12) :724-726

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