THE EFFECT OF METALLIC CONTAMINATION ON ENHANCED OXYGEN DIFFUSION IN SILICON AT LOW-TEMPERATURES

被引:23
作者
NEWMAN, RC
TIPPING, AK
TUCKER, JH
机构
来源
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS | 1985年 / 18卷 / 27期
关键词
D O I
10.1088/0022-3719/18/27/004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:L861 / L866
页数:6
相关论文
共 19 条
[1]   A CORRELATION BETWEEN THE ELECTRICAL BREAKDOWN OF SILICON BIPOLAR-TRANSISTORS AND IMPURITY PRECIPITATES [J].
AUGUSTUS, PD ;
KNIGHTS, J ;
KENNEDY, LW .
JOURNAL OF MICROSCOPY-OXFORD, 1980, 118 (MAR) :315-320
[2]   THE OXYGEN RELATED DONOR EFFECT IN SILICON [J].
BENTON, JL ;
KIMERLING, LC ;
STAVOLA, M .
PHYSICA B & C, 1983, 116 (1-3) :271-275
[3]   EFFECTS OF HEAT-TREATMENT ON DISLOCATION-FREE OXYGEN-CONTAINING SILICON-CRYSTALS [J].
CAPPER, P ;
JONES, AW ;
WALLHOUSE, EJ ;
WILKES, JG .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (04) :1646-1655
[4]   COOLING RATES OF LARGE-DIAMETER SILICON-CRYSTALS [J].
CAPPER, P ;
WILKES, JG .
APPLIED PHYSICS LETTERS, 1978, 32 (03) :187-189
[5]   CONFIGURATION + DIFFUSION OF ISOLATED OXYGEN IN SILICON + GERMANIUM [J].
CORBETT, JW ;
MCDONALD, RS ;
WATKINS, GD .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1964, 25 (08) :873-&
[6]   STRESS-INDUCED ALIGNMENT OF ANISOTROPIC DEFECTS IN CRYSTALS [J].
CORBETT, JW ;
WATKINS, GD .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1961, 20 (3-4) :319-320
[7]  
CORBETT JW, 1985, 13TH P INT C DEF SEM, P3
[8]   THE DIFFUSION OF OXYGEN IN SILICON AND GERMANIUM [J].
HAAS, C .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 15 (1-2) :108-111
[9]   ELECTRICAL AND OPTICAL PROPERTIES OF HEAT-TREATED SILICON [J].
KAISER, W .
PHYSICAL REVIEW, 1957, 105 (06) :1751-1756
[10]   AN INFRARED AND NEUTRON-SCATTERING ANALYSIS OF THE PRECIPITATION OF OXYGEN IN DISLOCATION-FREE SILICON [J].
LIVINGSTON, FM ;
MESSOLORAS, S ;
NEWMAN, RC ;
PIKE, BC ;
STEWART, RJ ;
BINNS, MJ ;
BROWN, WP ;
WILKES, JG .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1984, 17 (34) :6253-6276