DIFFUSION OF ARSENIC ALONG DISLOCATIONS IN EPITAXIAL SILICON FILMS

被引：13

作者：

CAMPBELL, DR

TU, KN

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] IBM CORP,SYST PROD DIV,E FISHKILL,NY 12533

来源：

THIN SOLID FILMS | 1975年 / 25卷 / 01期

关键词：

D O I：

10.1016/0040-6090(75)90257-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：213 / 220

页数：8

共 23 条

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[9]

GREEN R, 1968, J APPL PHYS, V39, P2937

[10] SELF-DIFFUSION ALONG DISLOCATIONS IN SINGLE-CRYSTAL AU FILMS [J].

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