RADIOFREQUENCY CAVITY ION-SOURCE IN SOLIDS MASS-SPECTROMETRY

被引:43
作者
DONOHUE, DL [1 ]
HARRISON, WW [1 ]
机构
[1] UNIV VIRGINIA,DEPT CHEM,CHARLOTTESVILLE,VA 22903
关键词
D O I
10.1021/ac60359a029
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
引用
收藏
页码:1528 / 1531
页数:4
相关论文
共 10 条
[1]   SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS [J].
ANDERSON, GS ;
MAYER, WN ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) :2991-&
[2]   NEW TECHNIQUE FOR ELEMENTAL ANALYSIS OF THIN SURFACE LAYERS OF SOLIDS [J].
COBURN, JW ;
KAY, E .
APPLIED PHYSICS LETTERS, 1971, 19 (09) :350-&
[3]  
COBURN JW, 1971, APPL PHYS LETT, V18, P425
[4]   HOLLOW-CATHODE IONIZATION FOR MASS-SPECTROMETRIC ANALYSIS OF CONDUCTING SOLIDS [J].
COLBY, BN ;
EVANS, CA .
ANALYTICAL CHEMISTRY, 1974, 46 (09) :1236-1242
[5]   CRITICAL PARAMETERS AFFECTING HOLLOW-CATHODE ION-SOURCE [J].
DAUGHTREY, EH ;
HARRISON, WW .
ANALYTICAL CHEMISTRY, 1975, 47 (07) :1024-1028
[6]   DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J].
DAVIDSE, PD ;
MAISSEL, LI .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) :574-&
[7]   MEASUREMENTS OF IONIC SPECIES PRESENT IN RF DISCHARGES OF ARGON AND ARGON-CESIUM [J].
GILKINSON, JL ;
HELD, H ;
CHANIN, LM .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (05) :2350-+
[8]   HOLLOW-CATHODE ION-SOURCE FOR SOLIDS MASS-SPECTROMETRY [J].
HARRISON, WW ;
MAGEE, CW .
ANALYTICAL CHEMISTRY, 1974, 46 (03) :461-464
[9]   RF SPUTTERING [J].
JACKSON, GN .
THIN SOLID FILMS, 1970, 5 (04) :209-&
[10]  
WEHNER GK, 1955, ADV ELECTRON ELECTRO, V7, P253