HETEROEPITAXIAL GROWTH OF KCL AND LIF ON A CLEAVED (001) FACE OF KBR

被引：38
作者：
SAIKI, K
NAKAMURA, Y
KOMA, A
机构：
[1] Department of Chemistry, The University of Tokyo, Tokyo
来源：
SURFACE SCIENCE | 1991年 / 250卷 / 1-3期
关键词：
ALKALI-HALIDES; EPITAXY;
D O I：
10.1016/0039-6028(91)90706-X
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
An initial stage of heteroepitaxial growth of KCl and LiF on a KBr substrate was studied using RHEED, EELS and AES. Both KCl and LiF films grow heteroepitaxially on a KBr substrate with their crystallographic axes parallel to that of substrate. In the case of KCl growth occurs in a well ordered layer-by-layer fashion and it is found that thickness of an intermediate region between KCl and KBr is less than 2 nm. In contrast three-dimensional island growth occurs in the case of LiF. Differences in lattice mismatch and solid solubility seem to determine the mechanism of heteroepitaxy of KCl and LiF on a KBr substrate.
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页码：27 / 32
页数：6
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