1/F NOISE IN N-CHANNEL SILICON-GATE MOS-TRANSISTORS

被引:67
作者
MIKOSHIBA, H
机构
关键词
D O I
10.1109/T-ED.1982.20815
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:965 / 970
页数:6
相关论文
共 50 条
[31]   THRESHOLD VOLTAGE VARIATIONS IN N-CHANNEL MOS-TRANSISTORS AND MOSFET-BASED SENSORS DUE TO OPTICAL RADIATION [J].
WLODARSKI, W ;
BERGVELD, P ;
VOORTHUYZEN, JA .
SENSORS AND ACTUATORS, 1986, 9 (04) :313-321
[32]   MODELING OF GATE OXIDE SHORTS IN MOS-TRANSISTORS [J].
SYRZYCKI, M .
IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 1989, 8 (03) :193-202
[33]   SHORT CHANNEL EFFECTS IN MOS-TRANSISTORS [J].
BJORKQVIST, K ;
ARNBORG, T .
PHYSICA SCRIPTA, 1981, 24 (02) :418-421
[34]   Impact of Gate Oxide Thickness on Flicker Noise (1/f) in PDSOI n-channel FETs [J].
Pathak, Shruti ;
Gupta, Sumreti ;
Rathi, Aarti ;
Srinivasan, P. ;
Dixit, Abhisek .
SOLID-STATE ELECTRONICS, 2024, 217
[35]   THRESHOLD VOLTAGES OF SHORT-CHANNEL DUAL-GATE MOS-TRANSISTORS [J].
BARSAN, RM .
REVUE ROUMAINE DE PHYSIQUE, 1982, 27 (02) :191-209
[36]   THRESHOLD VOLTAGE AND GAIN TERM BETA OF ION-IMPLANTED ENHANCEMENT-MODE N-CHANNEL MOS-TRANSISTORS [J].
KAMOSHID.M .
APPLIED PHYSICS LETTERS, 1973, 22 (08) :404-405
[37]   CURRENT-KINK NOISE OF N-CHANNEL ENHANCEMENT ESFI-MOS SOS TRANSISTORS [J].
FICHTNER, W ;
HOCHMAIR, E .
ELECTRONICS LETTERS, 1977, 13 (22) :675-676
[38]   IMPACT OF SCALING DOWN ON LOW-FREQUENCY NOISE IN SILICON MOS-TRANSISTORS [J].
GHIBAUDO, G ;
ROUXDITBUISSON, O ;
BRINI, J .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1992, 132 (02) :501-507
[39]   LOW-FREQUENCY NOISE IN MOS-TRANSISTORS [J].
GENTIL, P .
ONDE ELECTRIQUE, 1978, 58 (8-9) :565-575
[40]   The study of damage generation in n-channel MOS transistors operating in the substrate enhanced gate current regime [J].
Mohapatra, NR ;
Mahapatra, S ;
Rao, VR .
PROCEEDINGS OF THE 9TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 2002, :27-30